
High Energy Excimer Laser Cavity Mirrors
Rainbow Research Optics, Inc. offers a variety of mirrors for handling the many ranges and high powers of excimer lasers. These mirrors cover the laser lines of ArF (λ = 193 nm) and XeF (λ = 352 nm). These external cavity, high-energy excimer laser mirrors have been designed to withstand high pulsed powers. Each optic provides better than λ/10 surface flatness and surface finishes of 10-5 scratch-dig.
Features:
- ArF and XeF Excimer Laser Line Mirrors
- High Damage Threshold
Substrate material: UV CaF2 or VUV MgF2 Surface Figure: λ/10 @ 633nm Surface Quality: 20-10 laser quality Diameter Tolerance: +0.0/-0.20 mm Thickness Tolerance: ±0.25 mm Wedge: <3 are min. Reflectance: R > 97% at 633nm and R > 99.5% at 248nm ~ 353nm Clear Aperture: >85% of diameter Chamfer: 0.3mm at 45 typical Damage Thredold: 1j/cm2 10nsec pulse Adhesion Threshold: Per MIL-C-675APer MIL-C-675A |
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HOW TO ORDER
* Other percentage of reflection and dimensions available in prototype and production quantities.